Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine
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چکیده
منابع مشابه
Chemical vapour deposition of Group Vb metal phosphide thin films
The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 and VOCl3 with cyclohexylphosphine at substrate temperatures of 600 C deposits thin films of amorphous vanadium phosphide. The films are black/gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500 C – 600 C deposits films of crystalline -MP ...
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Titanium (Ti) is the ninth most abundant element on earth. The titanium mineral ores are widely distributed in different parts of the world. The two main ores of titanium include rutile (TiO2) and ilmenite (FeO.TiO2). It is aimed to provide the readers with an insight to the main processes currently employed to extract and recover titanium tetrachloride (TiCl4) from different titanium ores. Due...
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At the beginning of the seventies, a break-through took place in the telecommunication research. The introduction of Chemical Vapour Deposition technology in the manufacture of optical fibres allowed both technical quality and economical convenience to realise optical networks, thus beginning the telecommunication revolution. Since that moment, a great development of the CVD techniques has been...
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ژورنال
عنوان ژورنال: Applied Surface Science
سال: 2003
ISSN: 0169-4332
DOI: 10.1016/s0169-4332(03)00263-0